Facilities

Physical Property Measurement System
- Quantum Design PPMS-9 with EverCool Dewar
- Magnetic field range: 0-9 Tesla
- Temperature range: 1.8-400 Kelvin
- DC Transport
- AC Transport
- Horizontal Rotator
- Heat Capacity
- Torque Magnetometry
- Point contact spectroscopy
- Fast resistive measurements with current ramping rate up to 300A/s
- High pressure resistive measurements (up to 15 GPa)
High Pressure Experiment System
- Pcell 30 Cell (up tp 3 GPa) & Ppress
- CryoDAC PPMS Diamond Anvil Cell (up to 15~20 GPa)
- Optiprexx PLS Pressure Measurement Instrument
- MCell (up to 1.2GPa) (ANL, MPMS)
- Diamond Anvil (15 GPa) (ANL, MPMS)
Gas Sensor Test System
- Computer controlled
- Hydrogen concentrations: 0.001%-100%
- Sample temperatures: -40 ^oC ~ +300 ^oC
Glove Boxes
Vacuum Atmosphere Company (VAC) OMNI-LAB
- Vacuum Atmosphere Company (VAC) OMNI-LAB
- < 1 PPMO2 and H2O
Vapor Desposition and Crystal Growth Systems
- Lindberg 3-zone furnaces (up to 1100ºC)
- Lindberg 1-zone furnaces (up to 1100ºC)
- Lindberg box furnaces (up to 1700ºC)
Anodization Systems
- NESLAB RTE10 Refrigerated Bath
- Agilent E3612A Power Supplies (0-60V/0-0.5A; 0-120V/0-0.25A)
- hp 6115A Precision Power Supply (0-50V/0-0.8A; 50-100V/0-0.4A)
Thin Film Deposition System
- Home-built UHV Magnetron Sputtering System
- Vacuum Evaporator
High Energy Ball Milling
- Equipped with safety interlock system for operator protection
- Grinding samples in the 0.2 - 10 gram range or mixing up to 60 mL of sample
- Variable-range electronic timer is factory-set for 100-minute range
- Grinding and mixing vials available including stainless steel, tungsten carbide
Micromanipulator
- REL-4100A Optic Microscope
- BK Precision 1686A DC Regulated Power Supplies
Scanning Electron Microscope (ANL/EMC, operator)
- Hitachi S-4700 FE-SEM
Lithography Tools (ANL/CNM, user)
- Optic lithography (Karl Suss MA6)
- Electron-beam lithography (Raith 150)
Focused-ion-beam (FIB) System (ANL/EMC, user)